This search combines search strings from the content search (i.e. "Full Text", "Author", "Title", "Abstract", or "Keywords") with "Article Type" and "Publication Date Range" using the AND operator.
Beilstein J. Nanotechnol. 2017, 8, 784–788, doi:10.3762/bjnano.8.81
Figure 1: AFM images of the photoresist after 120 min of near-field etching with a He–Cd laser (325 nm, 3.81 ...
Figure 2: (a) Photoresist profile before (black) and after 60 min (blue) and 120 min (red) of 325 nm laser il...
Figure 3: (a) Evaluation of surface roughness reduction of 325 nm (purple) and 405 nm (blue) over a 2 h inter...
Figure 4: Absorption spectrum and cross-sectional profile. (a) Photoresist absorption curve, showing that 325...